| 1 |
Subsurface modification induced on ion-exchanged glass substrates by deposition and bombardment
Zhang WJ, Zhao ZM, Xie ZJ, Zhuang X, He EB
Applied Surface Science, 475, 542, 2019 |
| 2 |
Sputter deposition of copper oxide films
Dulmaa A, Vrielinck H, Khelifi S, Depla D
Applied Surface Science, 492, 711, 2019 |
| 3 |
Microcrystalline silicon thin film deposition from silicon tetrafluoride: Isolating role of ion energy using tailored voltage waveform plasmas
Wang JK, Daineka D, Elyaakoubi M, Johnson EV
Solar Energy Materials and Solar Cells, 190, 65, 2019 |
| 4 |
Note on the artefacts in SRIM simulation of sputtering
Shulga VI
Applied Surface Science, 439, 456, 2018 |
| 5 |
Dependence on size and curvature of sputtering yield in nanowires
Jimenez-Saez JC, Jimenez-Rodriguez JJ
Applied Surface Science, 446, 273, 2018 |
| 6 |
Angle-dependent sputter yield of rippled surfaces
Shulga VI
Applied Surface Science, 458, 18, 2018 |
| 7 |
Cellular responses to radical propagation from ion-implanted plasma polymer surfaces
Stewart CAC, Akhavan B, Santos M, Hung JC, Hawkins CL, Bao SS, Wise SG, Bilek MMM
Applied Surface Science, 456, 701, 2018 |
| 8 |
Preparation of nickel-containing conductive amorphous carbon films by magnetron sputtering with negative high-voltage pulsed substrate bias
Solovyev AA, Oskomov KV, Grenadyorov AS, Maloney PD
Thin Solid Films, 650, 37, 2018 |
| 9 |
Structural characterization of the interface structure of amorphous silicon thin films after post-deposition argon or hydrogen plasma treatment
Neumuller A, Sergeev O, Vehse M, Agert C
Applied Surface Science, 403, 200, 2017 |
| 10 |
Diamond-like carbon layers modified by ion bombardment during growth and researched by Resonant Ultrasound Spectroscopy
Kocourek T, Jelinek M, Pisarik P, Remsa J, Janovska M, Landa M, Zemek J, Havranek V
Applied Surface Science, 417, 213, 2017 |
