| 1 |
Area selective grafting of siloxane molecules on low-k dielectric with respect to copper surface
Rezvanov A, Gornev ES, de Marneffe JF, Armini S
Applied Surface Science, 476, 317, 2019 |
| 2 |
Metal barrier induced damage in self-assembly based organosilica low-k dielectrics and its reduction by organic template residues
Krishtab M, De Marneffe JF, Armini S, Meersschaut J, Benders H, Wilson C, De Gendt S
Applied Surface Science, 485, 170, 2019 |
| 3 |
The effects of vacuum-ultraviolet radiation on defects in low-k organosilicate glass (SiCOH) as measured with electron-spin resonance
Xue PP, Pei DF, Zheng HF, Li WY, Afanas'ev VV, Baklanov MR, de Marneffe JF, Lin YH, Fung HS, Chen CC, Nishi Y, Shohet JL
Thin Solid Films, 616, 23, 2016 |
| 4 |
Effect of UV Irradiation on Modification and Subsequent Wet Removal of Model and Post-Etch Fluorocarbon Residues
Le QT, de Marneffe JF, Conard T, Vaesen I, Struyf H, Vereecke G
Journal of the Electrochemical Society, 159(3), H208, 2012 |
| 5 |
Structural characterization of epitaxial Bi2Sr2CuO6+delta thin films deposited on SrTiO3 substrates using inverted cylindrical magnetron sputtering
Ye M, Zhang YZ, de Marneffe JF, Delplancke-Ogletree MP, Deltour R
Thin Solid Films, 377-378, 597, 2000 |
