High quality c-axis oriented epitaxial Bi2Sr2CuO6+delta thin films were deposited on 0 degrees and 6 degrees vicinal SrTiO3 (100) substrates using an inverted cylindrical magnetron sputtering method. Their structural properties, regarding the orientation, epitaxy, surface morphology, composition, and surface microstructure, were studied by X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, and atomic force microscopy. The influences of the deposition parameters and substrate surface structure on the structural properties of these epitaxial Bi2Sr2Cu6+delta thin films are studied. A metal-insulator transition is observed with a variation of the Sr deficiency. It is demonstrated that films on 0 degrees and 6 degrees vicinal substrates grow in the two-dimensional and step-flow modes, respectively. Optimal deposition conditions were obtained leading to an extremely smooth film surface and high epitaxial quality.