검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Proton conductivity at medium temperature range and chemical durability of phosphosilicate gels added with a third component Matsuda A, Nono Y, Tadanaga K, Minami T, Tatsumisago M Solid State Ionics, 162, 253, 2003 |
| 2 |
Development of self-aligned contact technology for 0.18 mu m static random access memory devices Qiao JM, Jin B, Phatak P, Yu JY, Geha S Journal of Vacuum Science & Technology B, 17(5), 2373, 1999 |
| 3 |
Quantitative determination of dielectric thin-film properties on product wafers using infrared reflection-absorption spectroscopy Niemczyk TM, Zhang LZ, Haaland DM, Radigan KJ Journal of Vacuum Science & Technology A, 16(6), 3490, 1998 |
| 4 |
A Vibrational Study of Ethanol Adsorption on Si(100) Eng J, Raghavachari K, Struck LM, Chabal YJ, Bent BE, Flynn GW, Christman SB, Chaban EE, Williams GP, Radermacher K, Manti S Journal of Chemical Physics, 106(23), 9889, 1997 |
| 5 |
A Comparative-Study of Spin-on and Chemical-Vapor-Deposited Teflon Amorphous Fluoropolymer Thin-Films Sharangpani R, Singh R Journal of the Electrochemical Society, 144(8), 2924, 1997 |
| 6 |
Infrared-Absorption Spectroscopy for Monitoring Condensable Gases in Chemical-Vapor-Deposition Applications Oneill JA, Passow ML, Cotler TJ Journal of Vacuum Science & Technology A, 12(3), 839, 1994 |
| 7 |
Comparison of Boranol and Silanol Reactivities in Boron-Doped SiO2 Chemical-Vapor-Deposition from Trimethyl Borate and Tetraethyl Orthosilicate Bartram ME, Moffat HK Journal of Vacuum Science & Technology A, 12(4), 1027, 1994 |
| 8 |
Chemical-Vapor-Deposition of TiSi2 Using SiH4 and TiCl4 Mendicino MA, Southwell RP, Seebauer EG Thin Solid Films, 253(1-2), 473, 1994 |