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| No. | Article |
|---|---|
| 1 |
Critical dimension control optimization methodology on shallow trench isolation substrate for sub-0.25 mu m technology gate patterning Fan MH, Gerung H, Yelehanka PR, Cheng A, Zhou MS, Chi C, Tan CH, Xie J Journal of Vacuum Science & Technology B, 19(2), 456, 2001 |