| 1 |
Simulations of a Feedback-Control Scheme for an Inductively-Coupled Plasma Source for Etching Applications
Yamada N, Ventzek PL, Sakai Y, Tagashira H, Kitamori K
Journal of the Electrochemical Society, 143(4), 1375, 1996 |
| 2 |
Model for a Large-Area Multifrequency Multiplanar Coil Inductively-Coupled Plasma Source
Yamada N, Ventzek PL, Date H, Sakai Y, Tagashira H
Journal of Vacuum Science & Technology A, 14(5), 2859, 1996 |
| 3 |
Simulations of Real-Time Control of 2-Dimensional Features in Inductively-Coupled Plasma Sources for Etching Applications
Ventzek PL, Yamada N, Sakai Y, Tagashira H, Kitamori K
Journal of Vacuum Science & Technology A, 13(5), 2456, 1995 |
| 4 |
2-Dimensional Modeling of High Plasma-Density Inductively-Coupled Sources for Materials Processing
Ventzek PL, Hoekstra RJ, Kushner MJ
Journal of Vacuum Science & Technology B, 12(1), 461, 1994 |
| 5 |
Investigation of Electron Source and Ion Flux Uniformity in High Plasma-Density Inductively-Coupled Etching Tools Using 2-Dimensional Modeling
Ventzek PL, Grapperhaus M, Kushner MJ
Journal of Vacuum Science & Technology B, 12(6), 3118, 1994 |
