검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Characterization of nitrogen distribution in HfO2 with low energy secondary ion mass spectrometry Jiang ZX, Kim K, Lerma J, Sieloff D, Luo TY, Yang JY, Triyoso D, Tseng H, Tobin P, Ramani N Journal of Vacuum Science & Technology A, 23(4), 589, 2005 |
| 2 |
Impact of deposition and annealing temperature on material and electrical characteristics of ALD HfO2 Triyoso D, Liu R, Roan D, Ramon M, Edwards NV, Gregory R, Werho D, Kulik J, Tam G, Irwin E, Wang XD, La LB, Hobbs C, Garcia R, Baker J, White BE, Tobin P Journal of the Electrochemical Society, 151(10), F220, 2004 |
| 3 |
HfO2 gate dielectrics deposited via tetrakis diethylamido hafnium Schaeffer J, Edwards NV, Liu R, Roan D, Hradsky B, Gregory R, Kulik J, Duda E, Contreras L, Christiansen J, Zollner S, Tobin P, Nguyen BY, Nieh R, Ramon M, Rao R, Hegde R, Rai R, Baker J, Voight S Journal of the Electrochemical Society, 150(4), F67, 2003 |
| 4 |
Characterization of advanced complementary metal-oxide-semiconductor processes with reverse secondary ion mass spectrometry profiling Jiang ZX, Lerma J, Lee JJ, Sieloff D, Chen S, Beck J, Backer S, Taylor W, Tseng H, Tobin P, Svedberg L Journal of Vacuum Science & Technology B, 21(4), 1487, 2003 |
| 5 |
Investigation of titanium nitride gates for tantalum pentoxide and titanium dioxide dielectrics Gilmer D, Hobbs C, Hegde R, La L, Adetutu O, Conner J, Tiner M, Prabhu L, Bagchi S, Tobin P Journal of Vacuum Science & Technology A, 18(4), 1158, 2000 |
| 6 |
Comparison of plasma chemistries for dry etching of Ta2O5 Lee KP, Jung KB, Singh RK, Pearton SJ, Hobbs C, Tobin P Journal of Vacuum Science & Technology A, 18(4), 1169, 2000 |
| 7 |
Ultraviolet light enhancement of Ta2O5 dry etch rates Lee KP, Cho H, Singh RK, Pearton SJ, Hobbs C, Tobin P Journal of Vacuum Science & Technology B, 18(1), 293, 2000 |
| 8 |
The development of acute exposure guideline levels for hazardous substances Rusch GM, Garrett R, Tobin P, Falke E, Lu PY Process Safety Progress, 19(2), 98, 2000 |
| 9 |
Inductively coupled plasma etching of Ta2O5 Lee KP, Jung KB, Singh RK, Pearton SJ, Hobbs C, Tobin P Journal of the Electrochemical Society, 146(10), 3794, 1999 |