화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Depth profiling and the effect of oxygen and carbon on the photoelectrical properties of amorphous silicon films deposited using tungsten wire filaments
Persheyev SK, Goldie DM, Gibson RAG, Rose MJ, Anthony S, Keeble DJ, Robb K, Main C, Reynolds S, Zrinscak I
Thin Solid Films, 395(1-2), 130, 2001
2 In-Situ Measurements of the Recombination at the Crystalline Silicon Amorphous-Silicon Heterointerface by Time-Resolved Microwave Conductivity Measurements During Low-Temperature Annealing and Silane Plasma Exposure
Neitzert HC, Kunst M
Journal of Vacuum Science & Technology A, 13(6), 2753, 1995