화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Dry etching of amorphous-Si gates for deep sub-100 nm silicon-on-insulator complementary metal-oxide semiconductor
Yost D, Forte T, Fritze M, Astolfi D, Suntharalingam V, Chen CK, Cann S
Journal of Vacuum Science & Technology B, 20(1), 191, 2002
2 Sub-100 nm KrF lithography for complementary metal-oxide-semiconductor circuits
Fritze M, Astolfi D, Liu H, Chen CK, Suntharalingam V, Preble D, Wyatt PW
Journal of Vacuum Science & Technology B, 17(2), 345, 1999