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Sr2FeMoO6 nanosized compound with dielectric sheaths for magnetically sensitive spintronic devices Kalanda N, Kim DH, Demyanov S, Yu SC, Yarmolich M, Petrov A, Oh SK Current Applied Physics, 18(1), 27, 2018 |
2 |
Test particle simulation of the role of ballistic electrons in hybrid dc/rf capacitively coupled CF4 plasmas Ventzek PLG, Denpoh K Journal of Vacuum Science & Technology A, 27(2), 287, 2009 |
3 |
Test particle simulation of the role of ballistic electrons in hybrid dc/rf capacitively coupled plasmas in argon Denpoh K, Ventzek PLG Journal of Vacuum Science & Technology A, 26(6), 1415, 2008 |
4 |
Advances in broadband radio-frequency sensing for real-time control of plasma-based semiconductor processing Garvin C, Grimard DS, Grizzle JW Journal of Vacuum Science & Technology A, 17(4), 1377, 1999 |
5 |
Measurement and error evaluation of electrical parameters at plasma relevant frequencies and impedances Garvin C, Grimard D, Grizzle J, Gilchrist BE Journal of Vacuum Science & Technology A, 16(2), 595, 1998 |
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Cubic boron nitride thin film deposition by unbalanced magnetron sputtering and dc pulsed substrate biasing Otano-Rivera W, Pilione LJ, Zapien JA, Messier R Journal of Vacuum Science & Technology A, 16(3), 1331, 1998 |
7 |
Electrical optimization of plasma-enhanced chemical vapor deposition chamber cleaning plasmas Sobolewski MA, Langan JG, Felker BS Journal of Vacuum Science & Technology B, 16(1), 173, 1998 |
8 |
Energy and Angle Distributions of Ions Striking the Spherical Target in Plasma Source Ion-Implantation Wang DZ, Ma TC, Deng XL Journal of Vacuum Science & Technology B, 12(2), 905, 1994 |