검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Cryogenic BF2+ Implantation near Amorphization Threshold Dose for Halo Junctions in Sub-30 nm Device Technologies Park HH, Todorov S, Colombeau B, Rodier D, Decker-Lucke K Electrochemical and Solid State Letters, 15(2), H31, 2012 |