화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Resist materials for proton beam writing: A review
van Kan JA, Malar P, Wang YH
Applied Surface Science, 310, 100, 2014
2 Novel multi-alicyclic polymers for enhancing plasma etch resistance in 193 nm lithography
Lee JH, Ahn KD, Cho I
Polymer, 42(4), 1757, 2001
3 A review of ion projection lithography
Melngailis J, Mondelli AA, Berry IL, Mohondro R
Journal of Vacuum Science & Technology B, 16(3), 927, 1998
4 Novel Chemically Amplified Imaging Materials Containing Malonate Pendant Groups
Havard JM, Frechet JM
Polymer Bulletin, 37(4), 475, 1996