| 1 |
Oxygen additive effects on decomposition rate of poly(vinyl phenol)-based polymers using hydrogen radicals produced by a tungsten hot-wire catalyst
Yamamoto M, Nagaoka S, Ohdaira K, Umemoto H, Horibe H
Thin Solid Films, 679, 22, 2019 |
| 2 |
Decomposition processes of photoresist polymers by H atoms produced on hot wire surfaces
Umemoto H, Kato T, Takiguchi M, Takagi S, Horibe H
Thin Solid Films, 635, 27, 2017 |
| 3 |
Removal of ion-implanted photoresists on GaAs using two organic solvents in sequence
Oh E, Na J, Lee S, Lim S
Applied Surface Science, 376, 34, 2016 |
| 4 |
Effects of UV-irradiation on Removal Process of Photoresist by Aqueous Ozone
Abe Y, Kaneko A, Yagi T, Hamada H, Ike M, Asano T, Kato T, Fujimori K
KAGAKU KOGAKU RONBUNSHU, 36(1), 41, 2010 |
| 5 |
Improvement of photoresist removal efficiency in ozonated water cleaning system
Lee J, Park K, Lim S
Journal of Industrial and Engineering Chemistry, 14(1), 100, 2008 |
| 6 |
Systematic study on photoresist removal using hydrogen atoms generated on heated catalyzer
Hashimoto K, Masuda A, Matsumura H, Ishibashi T, Takao K
Thin Solid Films, 501(1-2), 326, 2006 |
