검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Power reduction for recovery of a FinFET by electrothermal annealing Han JK, Park JY, Choi YK Solid-State Electronics, 151, 6, 2019 |
| 2 |
Size dependence of TiN/HfO2/Ti MIM ReRAM resistance states: Model and experimental results Chen FT, Lee HY, Chen YS, Chen PS, Gu P, Chen CW, Hsu YY, Liu WH, Chen WS, Tsai MJ, Lo SC, Lai MW Current Applied Physics, 10(1), E75, 2010 |
| 3 |
Process damage assessment of a low energy inductively coupled plasma-based neutral source Tang XM, Wang Q, Manos DM Journal of Vacuum Science & Technology B, 18(3), 1262, 2000 |
| 4 |
Evaluation of plasma charging damage during polysilicon gate etching process in a decoupled plasma source reactor Ma SM, Jain M, Chinn JD Journal of Vacuum Science & Technology A, 16(3), 1440, 1998 |
| 5 |
Repair of Plasma Etch Related Gate Perimeter Damage Using Low-Temperature Oxidation Guldi RL, Wyke DR Journal of the Electrochemical Society, 143(2), 628, 1996 |
| 6 |
Evaluation and Control of Device Damage in High-Density Plasma-Etching Gadgil PK, Mantei TD, Mu XC Journal of Vacuum Science & Technology B, 12(1), 102, 1994 |