| 1 |
Structure and electronic properties of AlCrOxN1-x thin films deposited by reactive magnetron sputtering
Najafi H, Karimi A, Oveisi E, Morstein M
Thin Solid Films, 572, 176, 2014 |
| 2 |
Effects of Si and Y in structural development of (Al,Cr,Si/Y)OxN1 (-) (x) thin films deposited by magnetron sputtering
Najafi H, Karimi A, Alexander D, Dessarzin P, Morstein M
Thin Solid Films, 549, 224, 2013 |
| 3 |
Correlation between anionic substitution and structural properties in AlCr(O(x)N(1-x)) coatings deposited by lateral rotating cathode arc PVD
Najafi H, Karimi A, Dessarzin P, Morstein M
Thin Solid Films, 520(5), 1597, 2011 |
| 4 |
Deposition and characterization of pulsed direct current magnetron sputtered Al95.5Cr2.5Si2 (N1-xOx) thin films
Najafi H, Shetty A, Karimi A, Morstein M
Thin Solid Films, 519(1), 319, 2010 |
| 5 |
Development of novel coating technology by vacuum arc with rotating cathodes for industrial production of nc-(Al1-xTix)N/a-Si3N4 superhard nanocomposite coatings for dry, hard machining
Jilek M, Cselle T, Holubar P, Morstein M, Veprek-Heijman MGJ, Veprek S
Plasma Chemistry and Plasma Processing, 24(4), 493, 2004 |
| 6 |
On the behaviour of indentation fracture in TiAlSiN hard thin films
Nakonechna O, Cselle T, Morstein M, Karimi A
Thin Solid Films, 447, 406, 2004 |
| 7 |
Volatile beta-ketoiminato- and beta-diketiminato-based zirconium complexes as potential MOCVD precursors
Franceschini PL, Morstein M, Berke H, Schmalle HW
Inorganic Chemistry, 42(22), 7273, 2003 |
| 8 |
Plasma-CVD-coated glass beads as photocatalyst for water decontamination
Karches M, Morstein M, von Rohr P, Pozzo RL, Giombi JL, Baltanas MA
Catalysis Today, 72(3-4), 267, 2002 |
| 9 |
Surface inorganic chemistry: The reaction of hydroxyl-terminated thiols on gold with a zirconium coordination compound
Dicke C, Morstein M, Hahner G
Langmuir, 18(2), 336, 2002 |
| 10 |
Fracture mechanisms in nanoscale layered hard thin films
Karimi A, Wang Y, Cselle T, Morstein M
Thin Solid Films, 420-421, 275, 2002 |
