화학공학소재연구정보센터
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No. Article
1 Low-temperature homoepitaxial growth of 4H-SiC with CH3Cl and SiCl4 precursors
Kotamraju S, Krishnan B, Melnychuk G, Koshka Y
Journal of Crystal Growth, 312(5), 645, 2010
2 Triangular defects in the low-temperature halo-carbon homoepitaxial growth of 4H-SiC
Das H, Melnychuk G, Koshka Y
Journal of Crystal Growth, 312(12-13), 1912, 2010
3 Epitaxial growth of 4H-SiC at low temperatures using CH3Cl carbon gas precursor: Growth rate, surface morphology, and influence of gas phase nucleation
Koshka Y, Lin HD, Melnychuk G, Wood C
Journal of Crystal Growth, 294(2), 260, 2006
4 Homoepitaxial growth of 4H-SiC using CH3Cl carbon precursor
Koshka Y, Lin HD, Melnychuk G, Mazzola MS, Wyatt JL
Materials Science Forum, 483, 81, 2005
5 Experimental investigation and simulation of silicon droplets formation during SiCCVD epitaxial growth
Melnychuk G, Koshka Y, Mazzola MS, Wyatt JL
Materials Science Forum, 483, 105, 2005
6 Improved resolution of epitaxial thin film doping using FTIR reflectance spectroscopy
Mazzola MS, Sunkari SG, Mazzola JP, Das H, Melnychuk G, Koshka Y, Wyatt JL, Zhang J
Materials Science Forum, 483, 397, 2005
7 Computational modeling for the development of CVD SiC epitaxial growth processes
Melnychuk G, Koshka Y, Yingquan S, Mazzola M, Pittman CU
Materials Science Forum, 433-4, 177, 2002
8 Electrical characterization of Schottky diodes fabricated on SiC epitaxial layers grown on porous SiC substrates
Kuznetsov NI, Mynbaeva MG, Melnychuk G, Dmitriev VA, Saddow SE
Applied Surface Science, 184(1-4), 483, 2001