검색결과 : 13건
| No. | Article |
|---|---|
| 1 |
Apparatus to measure electron reflection Maldonado JR, Sun Y, Tsai R, Pease F, Pianetta P Journal of Vacuum Science & Technology B, 27(6), 2644, 2009 |
| 2 |
Evaluation of electron energy spread in CsBr based photocathodes Maldonado JR, Sun Y, Liu Z, Liu XF, Tanimoto S, Pianetta P, Pease F Journal of Vacuum Science & Technology B, 26(6), 2085, 2008 |
| 3 |
CsBr/GaN heterojunction photoelectron source Maldonado JR, Liu Z, Sun Y, Schuetter S, Pianetta P, Pease RFW Journal of Vacuum Science & Technology B, 25(6), 2266, 2007 |
| 4 |
Photoelectron emission studies in CsBr at 257 nm Maldonado JR, Liu Z, Sun Y, Pianetta PA, Pease FW Journal of Vacuum Science & Technology B, 24(6), 2886, 2006 |
| 5 |
Cs halide photocathode for multi-electron-beam pattern generator Maldonado JR, Coyle ST, Shamoun B, Yu M, Gesley M, Pianetta P Journal of Vacuum Science & Technology B, 22(6), 3025, 2004 |
| 6 |
Preliminary evaluation of surface plasmon enhanced light transmission with a scanning 257 nm ultraviolet microscope Maldonado JR, Coyle ST, Varner JK, Moore RC, Stark PRH, Larson DN Journal of Vacuum Science & Technology B, 22(6), 3552, 2004 |
| 7 |
Negative electron affinity group III-nitride photocathode demonstrated as a high performance electron source Machuca F, Liu Z, Maldonado JR, Coyle ST Journal of Vacuum Science & Technology B, 22(6), 3565, 2004 |
| 8 |
High-power collimated laser-plasma source for proximity x-ray nanolithography Gaeta CJ, Rieger H, Turcu ICE, Forber RA, Campeau SM, Cassidy KL, Powers MF, Stone A, Maldonado JR, Mrowka S, French G, Naungayan J, Kelsy C, Hark P, Morris JH, Foster RM, Carosella JC, Fleming D, Selzer F, Siegert H, Smith HI, Lim MH, Cheng Z, Burdett J, Gibson D, Whitlock RR, Dozier CM, Newman DA Journal of Vacuum Science & Technology B, 21(1), 280, 2003 |
| 9 |
Fabrication of X-Ray-Lithography Masks with Optical Lithography Latulipe D, Maldonado JR, Mitchell P, Leduc R, Babich I Journal of Vacuum Science & Technology B, 14(6), 4345, 1996 |
| 10 |
Effect of Absorber Thickness on Image Shortening in X-Ray-Lithography Maldonado JR, Dellaguardia F, Hector S, Mccord M, Liebmann L, Oertel HK Journal of Vacuum Science & Technology B, 13(6), 3094, 1995 |