검색결과 : 16건
| No. | Article |
|---|---|
| 1 |
Contacting graphene in a 200 mm wafer silicon technology environment Lisker M, Lukosius M, Kitzmann J, Fraschke M, Wolansky D, Schulze S, Lupina G, Mai A Solid-State Electronics, 144, 17, 2018 |
| 2 |
Metal-organic chemical vapor deposition of high-k dielectric Ce-Al-O layers from various metal-organic precursors for metal-insulator-metal capacitor applications Abrutis A, Lukosius M, Skapas M, Stanionyte S, Kubilius V, Wenger C, Zauner A Thin Solid Films, 536, 68, 2013 |
| 3 |
CexAlyOz/TiN stack analysis for Metal-Insulator-Metal applications: Effect of annealing and the metal electrode deposition method Kaynak CB, Lukosius M, Tillack B, Wenger C, Abrutis A, Skapas M Thin Solid Films, 520(14), 4518, 2012 |
| 4 |
Optical properties and band gap characterization of high dielectric constant oxides Fursenko O, Bauer J, Lupina G, Dudek P, Lukosius M, Wenger C, Zaumseil P Thin Solid Films, 520(14), 4532, 2012 |
| 5 |
Properties of atomic-vapor and atomic-layer deposited Sr, Ti, and Nb doped Ta2O5 Metal-Insulator-Metal capacitors Lukosius M, Kaynak CB, Kubotsch S, Blomberg T, Ruhl G, Wenger C Thin Solid Films, 520(14), 4576, 2012 |
| 6 |
Textured strontium titanate layers on platinum by atomic layer deposition Blomberg T, Anttila J, Haukka S, Tuominen M, Lukosius M, Wenger C, Saukkonen T Thin Solid Films, 520(21), 6535, 2012 |
| 7 |
HfO2, Sr-Ta-O and Ti-Ta-O High-k Dielectrics for Metal-Insulator-Metal Applications Lukosius M, Kaynak CB, Rushworth S, Wenger C Journal of the Electrochemical Society, 158(5), G119, 2011 |
| 8 |
Atomic Vapor Depositions of Ti-Ta-O thin films for Metal-Insulator-Metal applications Lukosius M, Kaynak CB, Wenger C, Ruhl G, Rushworth S, Baumann P Thin Solid Films, 519(11), 3831, 2011 |
| 9 |
Effect of the composition on the bandgap width of high-kappa MexTiyOz (Me = Hf, Ta, Sr) layers Wang WC, Badylevich M, Afanas'ev VV, Stesmans A, Popovici M, Tomida K, Menou N, Kittl JA, Lukosius M, Kaynak CB, Wenger C Thin Solid Films, 519(17), 5730, 2011 |
| 10 |
Enhanced leakage current behavior of Sr2Ta2O7-x/SrTiO3 bilayer dielectrics for metal-insulator-metal capacitors Kaynak CB, Lukosius M, Costina I, Tillack B, Wenger C, Ruhl G, Blomberg T Thin Solid Films, 519(17), 5734, 2011 |