화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 Comparison of Ohmic Metallization Schemes for Ingaaln
Ren F, Vartuli CB, Pearton SJ, Abernathy CR, Donovan SM, Mackenzie JD, Shul RJ, Zolper JC, Lovejoy ML, Baca AG, Hagerottcrawford M, Jones KA
Journal of Vacuum Science & Technology A, 15(3), 802, 1997
2 High-Rate Reactive Ion Etch and Electron-Cyclotron-Resonance Etching of GaAs via Holes Using Thick Polyimide and Photoresist Masks
Shul RJ, Lovejoy ML, Word JC, Howard AJ, Rieger DJ, Kravitz SH
Journal of Vacuum Science & Technology B, 15(3), 657, 1997
3 Thermal-Stability of W, WSix, and Ti/Al Ohmic Contacts to Ingan, Inn, and Inaln
Vartuli CB, Pearton SJ, Abernathy CR, Mackenzie JD, Shul RJ, Zolper JC, Lovejoy ML, Baca AG, Hagerottcrawford M
Journal of Vacuum Science & Technology B, 14(6), 3520, 1996
4 Multilevel Interconnects for Heterojunction Bipolar-Transistor Integrated-Circuit Technologies
Patrizi GA, Lovejoy ML, Enquist PM, Schneider RP, Hou HQ
Thin Solid Films, 290-291, 435, 1996
5 Thin-Film Tantalum Nitride Resistor Technology for Phosphide-Based Optoelectronics
Lovejoy ML, Patrizi GA, Rieger DJ, Barbour JC
Thin Solid Films, 290-291, 513, 1996
6 Low-Resistivity Ohmic Contacts to Moderately Doped N-GaAs with Low-Temperature Processing
Lovejoy ML, Howard AJ, Zavadil KR, Rieger DJ, Shul RJ, Barnes PA
Journal of Vacuum Science & Technology A, 13(3), 758, 1995
7 Plasma-Induced Damage of GaAs During Etching of Refractory-Metal Contacts
Shul RJ, Lovejoy ML, Baca AG, Zolper JC, Rieger DJ, Hafich MJ, Corless RF, Vartuli CB
Journal of Vacuum Science & Technology A, 13(3), 912, 1995
8 Plasma-Induced Damage of GaAs PN-Junction Diodes Using Electron-Cyclotron-Resonance Generated Cl-2/Ar, BCl3/Ar, Cl-2/BCl3/Ar, and Sicl4/Ar Plasmas
Shul RJ, Lovejoy ML, Hetherington DL, Rieger DJ, Klem JF, Melloch MR
Journal of Vacuum Science & Technology B, 13(1), 27, 1995
9 AlGaAsSb/Ingasb Quantum-Well Heterostructures for P-Channel Field-Effect Transistors
Klem JF, Lovejoy ML
Journal of Vacuum Science & Technology B, 13(2), 702, 1995
10 New Methods for Circuit Fabrication on Poly(Tetrafluoroethylene) Substrates
Howard AJ, Rye RR, Ricco AJ, Rieger DJ, Lovejoy ML, Sloan LR, Mitchell MA
Journal of the Electrochemical Society, 141(12), 3556, 1994