화학공학소재연구정보센터
검색결과 : 37건
No. Article
1 Atomic Layer Deposition of Hafnium Silicate Thin Films Using Tetrakis(diethylamido)hafnium and Tris(2-methyl-2-butoxy)silanol
Liu J, Lennard WN, Goncharova LV, Landheer D, Wu XH, Rushworth SA, Jones AC
Journal of the Electrochemical Society, 156(8), G89, 2009
2 Si nanocrystal memory devices self-assembled by in situ rapid thermal annealing of ultrathin a-Si on SiO2
Chen JH, Lei TF, Landheer D, Wu X, Liu J, Chao TS
Electrochemical and Solid State Letters, 10(10), H302, 2007
3 Performance improvement of CoTiO3 high-k dielectrics with nitrogen incorporation
Chen JH, Huang TB, Wu XH, Landheer D, Lei TF, Chao TS
Journal of the Electrochemical Society, 154(1), G18, 2007
4 Annealing effects on the chemical configuration of uncapped and (poly-Si)-capped HfOxNy films deposited on Si(001)
Couillard M, Lee MS, Landheer D, Wu X, Botton GA
Journal of the Electrochemical Society, 152(8), F101, 2005
5 Characterization of interfacial layer of ultrathin Zr silicate on Si(100) using spectroscopic ellipsometry and HRTEM
Ahn H, Chen HW, Landheer D, Wu X, Chou LJ, Chao TS
Thin Solid Films, 455-56, 318, 2004
6 Depth profiling of ultrathin films using medium energy ion scattering
Kim J, Lennard WN, McNorgan CP, Hendriks J, Mitchell IV, Landheer D, Gredley J
Current Applied Physics, 3(1), 75, 2003
7 Structure and thermal stability of MOCVD ZrO2 films on Si (100)
Wu X, Landheer D, Graham MJ, Chen HW, Huang TY, Chao TS
Journal of Crystal Growth, 250(3-4), 479, 2003
8 Ultrathin zirconium silicate films deposited on Si(100) using Zr(O-i-Pr)(2)(thd)(2), Si(O-t-Bu)(2)(thd)(2), and nitric oxide
Chen HW, Huang TY, Landheer D, Wu X, Moisa S, Sproule GI, Kim JK, Lennard WN, Chao TS
Journal of the Electrochemical Society, 150(7), C465, 2003
9 Structural comparison of gadolinium and lanthanum silicate films on Si(100) by HRTEM, EELS and SAED
Wu X, Landheer D, Quance T, Graham MJ, Botton GA
Applied Surface Science, 200(1-4), 15, 2002
10 Composition and growth of thin anodic oxides formed on InP (100)
Djenizian T, Sproule GI, Moisa S, Landheer D, Wu X, Santinacci L, Schmuki P, Graham MJ
Electrochimica Acta, 47(17), 2733, 2002