| 1 |
Nano-image profiles transferred by near field phase-shifting lithography precisely simulated by finite element method and fabricated
Lai FD
Applied Surface Science, 258(6), 2113, 2012 |
| 2 |
The Copper Sulfide Coating on Polyacrylonitrile with a Chelating Agent of Ethylenediaminetetraacetic Acid by an Electroless Deposition Method and Its EMI Shielding Effectiveness
Chen YH, Huang CY, Roan ML, Lai FD, Chen KN, Yeh JT
Journal of Applied Polymer Science, 115(1), 570, 2010 |
| 3 |
Electroless deposition of the copper sulfide coating on polyacrylonitrile with a chelating agent of triethanolamine and its EMI Shielding Effectiveness
Chen YH, Huang CY, Lai FD, Roan ML, Chen KN, Yeh JT
Thin Solid Films, 517(17), 4984, 2009 |
| 4 |
Proposed single layer composite film used as high transmission phase shifting masks for the 32, 45, and 65 nm technology nodes
Lai FD, Huang JL
Journal of Vacuum Science & Technology B, 25(6), 1799, 2007 |
| 5 |
ArF-line high transmittance attenuated phase shift mask blanks using amorphous Al2O3-ZrO2-SiO2 composite thin films for the 65-45-and 32-nm technology nodes
Lai FD, Hua JM, Huang CY, Ko FH, Wang LA, Lin CH, Chang CM, Lee S, Chern GW
Thin Solid Films, 496(2), 247, 2006 |
| 6 |
Optical simulation, optimized design and fabrication of (ZrO2)(x)-(Al2O3)(1-x) composite films with thin inserted TiO2 layers for ArF-line high transmission attenuated phase shift mask blank applications
Lai FD
Applied Surface Science, 252(4), 996, 2005 |
| 7 |
Composite thin films of (ZrO2)(x)-(Al2O3)(1-x) for high transmittance attenuated phase shifting mask in ArF optical lithography
Lai FD
Journal of Vacuum Science & Technology B, 22(3), 1174, 2004 |
| 8 |
Optimized HT-AttPSM blanks using Al2O3/TiO2 multilayer films for the 65 nm technology node
Lai FD
Journal of Vacuum Science & Technology B, 22(6), 3097, 2004 |
| 9 |
Ultrathin TiO2 amorphous films for high transmittance APSM blanks at 157 and 193 nm wavelength simultaneously
Lai FD, Chang CM, Wang LA, Yih TS
Journal of Vacuum Science & Technology B, 21(6), 3062, 2003 |
| 10 |
Fabrication and characterization of aluminum oxide/chromium oxide superlattice for attenuated phase-shifting mask working at 193 nm wavelength
Lai FD, Wang LA
Thin Solid Films, 409(2), 220, 2002 |
