검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
A new positive resist based on poly(4-hydroxystyrene) for KrF excimer laser lithography Kim I, Park SJ, Lee SH, Kim ER, Kim KC, Lee H Molecular Crystals and Liquid Crystals Science and Technology. Section A. Molecular Crystals and Liquid Crystals, 349, 179, 2000 |
| 2 |
Acid diffusion control in chemically amplified resists Kim JB, Choi JH, Kwon YG, Jung MH, Chang KH Polymer, 40(4), 1087, 1999 |