Molecular Crystals and Liquid Crystals Science and Technology. Section A. Molecular Crystals and Liquid Crystals, Vol.349, 179-182, 2000
A new positive resist based on poly(4-hydroxystyrene) for KrF excimer laser lithography
A positive acrylic silicon containing polymer was synthesized with 1,3-bis(trimethylsily])isopropyl methacrylate (BPMA) and 4-hydroxy styrene (4-HST) for KrF lithography. Lithographic evaluation shows the capability of 0.2 mum line and space with 2 wt% PAG concentration.