화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Simulations of a Feedback-Control Scheme for an Inductively-Coupled Plasma Source for Etching Applications
Yamada N, Ventzek PL, Sakai Y, Tagashira H, Kitamori K
Journal of the Electrochemical Society, 143(4), 1375, 1996
2 Simulations of Real-Time Control of 2-Dimensional Features in Inductively-Coupled Plasma Sources for Etching Applications
Ventzek PL, Yamada N, Sakai Y, Tagashira H, Kitamori K
Journal of Vacuum Science & Technology A, 13(5), 2456, 1995