화학공학소재연구정보센터
검색결과 : 13건
No. Article
1 Coating thickness effect of metallic glass thin film on the fatigue-properties improvement of 7075 aluminum alloy
Tsai PH, Li TH, Hsu KT, Ke JH, Jang JSC, Chu JP
Thin Solid Films, 677, 68, 2019
2 Multi-functional CoS2-N-C porous carbon composite derived from metal-organic frameworks for high performance lithium-sulfur batteries
Luo SQ, Zheng CM, Sun WW, Wang YQ, Ke JH, Guo QP, Liu SK, Hong XB, Li YJ, Xie W
Electrochimica Acta, 289, 94, 2018
3 Preparation and characterization of Cu(In,Ga)(Se,S)(2) films without selenization by co-sputtering from Cu(In,Ga)Se-2 quaternary and In2S3 targets
Lin YC, Ke JH, Yen WT, Liang SC, Wu CH, Chiang CT
Applied Surface Science, 257(9), 4278, 2011
4 Growth characteristics and properties of ZnO:Ga thin films prepared by pulsed DC magnetron sputtering
Yen WT, Lin YC, Yao PC, Ke JH, Chen YL
Applied Surface Science, 256(11), 3432, 2010
5 Surface textured ZnO:Al thin films by pulsed DC magnetron sputtering for thin film solar cells applications
Yen WT, Lin YC, Ke JH
Applied Surface Science, 257(3), 960, 2010
6 Subcooled flow boiling heat transfer and associated bubble characteristics of FC-72 on a heated micro-pin-finned silicon chip
Chang WR, Chen CA, Ke JH, Lin TF
International Journal of Heat and Mass Transfer, 53(23-24), 5605, 2010
7 Effect of post-annealing on the optoelectronic properties of ZnO:Ga films prepared by pulsed direct current magnetron sputtering
Yen WT, Lin YC, Yao PC, Ke JH, Chen YL
Thin Solid Films, 518(14), 3882, 2010
8 Extended metal-atom chains with an inert second row transition metal: [Ru-5(mu(5)-tpda)(4)X-2] (tpda(2-) = tripyridyldiamido dianion, X = Cl and NCS)
Yin CX, Huang GC, Kuo CK, Fu MD, Lu HC, Ke JH, Shih KN, Huang YL, Lee GH, Yeh CY, Chen CH, Peng SM
Journal of the American Chemical Society, 130(31), 10090, 2008
9 Saturated flow boiling heat transfer and associated bubble characteristics of FC-72 on a heated micro-pin-finned silicon chip
Lie YM, Ke JH, Chang WR, Cheng TC, Lin TF
International Journal of Heat and Mass Transfer, 50(19-20), 3862, 2007
10 CF4 plasma treatment for preparing gas diffusion layers in membrane electrode assemblies
Pai YH, Ke JH, Huang HF, Lee CM, Jyh-Myng Z, Shieu FS
Journal of Power Sources, 161(1), 275, 2006