| 1 |
High-rate Deposition of Polycrystalline Diamond Film Using Time-series Exposure of Modulated/Non-modulated Induction Thermal Plasmas at Different Flow Rates of Carbon Source Gas
Hata K, Tanaka Y, Kano N, Nakano Y, Uesugi Y, Ishijima T
Plasma Chemistry and Plasma Processing, 41(3), 757, 2021 |
| 2 |
Three-Dimensional Two-Temperature Modeling of Ar Loop-Type Inductively Coupled Thermal Plasma for Surface Modification
Ozeki G, Tanaka Y, Sugiyama Y, Nakano Y, Ishijima T, Uesugi Y, Yukimoto T, Kawaura H
Plasma Chemistry and Plasma Processing, 41(1), 85, 2021 |
| 3 |
Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed
Tial MKS, Tanaka Y, Maruyama Y, Tsuchiya T, Uesugi Y, Ishijima T
Plasma Chemistry and Plasma Processing, 37(3), 857, 2017 |
| 4 |
Silicon inclusion effect on fullerene formation under induction thermal plasma condition
Wang C, Imahori T, Tanaka Y, Sakuta T, Takikawa H, Matsuo H
Thin Solid Films, 407(1-2), 72, 2002 |
| 5 |
Synthesis of fullerenes from carbon powder by using high power induction thermal plasma
Wang C, Imahori T, Tanaka Y, Sakuta T, Takikawa H, Matsuo H
Thin Solid Films, 390(1-2), 31, 2001 |
