검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
SiO2 etching with perfluorobutadiene in a dual frequency plasma reactor Fracassi F, d'Agostino R, Fornelli E, Illuzzi F, Shirafuji T Journal of Vacuum Science & Technology A, 21(3), 638, 2003 |
| 2 |
On the use and limits of mass spectrometry for the characterization of fluorocarbon emission during plasma processing Fracassi F, d'Agostino R, Illuzzi F Journal of the Electrochemical Society, 149(5), G318, 2002 |
| 3 |
Evaluation of plasmas fed with hydrofluorocarbons-oxygen mixtures for SiO2 dry etching Fracassi F, d'Agostino R, Illuzzi F Journal of Vacuum Science & Technology B, 19(2), 427, 2001 |