검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Shallow As dose measurements of patterned wafers with secondary ion mass spectrometry and low energy electron induced x-ray emission spectroscopy Ehrke HU, Loibl N, Moret MP, Horreard F, Choi J, Hombourger C, Paret V, Benbalagh R, Morel N, Schuhmacher M Journal of Vacuum Science & Technology B, 28(1), C1C54, 2010 |
| 2 |
LEXES and SIMS as complementary techniques for full quantitative characterization of nanometer structures Hombourger C, Staub R, Schuhmacher M, Desse F, de Chambost E, Hitzman C Applied Surface Science, 203, 383, 2003 |
| 3 |
Quantitative determination of dopant dose in shallow implants using the low energy x-ray emission spectroscopy technique Staub PF, Hombourger C, Schuhmacher M Journal of Vacuum Science & Technology B, 20(1), 436, 2002 |
| 4 |
Study of the Adhesion Between A-CH Films and Ta6V Substrates by Electron-Induced X-Ray-Emission Spectroscopy (Exes) Jonnard P, Tixier C, Desmaison J, Hombourger C, Bonnelle C Thin Solid Films, 306(1), 119, 1997 |