검색결과 : 17건
| No. | Article |
|---|---|
| 1 |
Hydrogen-dominated plasma, due to silane depletion, for microcrystalline silicon deposition Howling AA, Sobbia R, Hollenstein C Journal of Vacuum Science & Technology A, 28(4), 989, 2010 |
| 2 |
Input silane concentration effect on the a-Si:H to mu c-Si:H transition width Feltrin A, Strahm B, Bugnon G, Sculati-Meillaud F, Ballif C, Howling AA, Hollenstein C Solar Energy Materials and Solar Cells, 94(3), 432, 2010 |
| 3 |
Non-intrusive plasma diagnostics for the deposition of large area thin film silicon Howling AA, Strahm B, Hollenstein C Thin Solid Films, 517(23), 6218, 2009 |
| 4 |
Optimization of the microcrystalline silicon deposition efficiency Strahm B, Howling AA, Sansonnens L, Hollenstein C Journal of Vacuum Science & Technology A, 25(4), 1198, 2007 |
| 5 |
Microcrystalline silicon deposited at high rate on large areas from pure silane with efficient gas utilization Strahm B, Howling AA, Sansonnens L, Hollenstein C, Kroll U, Meier J, Ellert C, Feitknecht L, Ballif C Solar Energy Materials and Solar Cells, 91(6), 495, 2007 |
| 6 |
Electromagnetic sources of nonuniformity in large area capacitive reactors Howling AA, Sansonnens L, Hollenstein C Thin Solid Films, 515(12), 5059, 2007 |
| 7 |
Application of the shaped electrode technique to a large area rectangular capacitively coupled plasma reactor to suppress standing wave nonuniformity Sansonnens L, Schmidt H, Howling AA, Hollenstein C, Ellert C, Buechel A Journal of Vacuum Science & Technology A, 24(4), 1425, 2006 |
| 8 |
Measurements and consequences of nonuniform radio frequency plasma potential due to surface asymmetry in large area radio frequency capacitive reactors Sansonnens L, Strahm B, Derendinger L, Howling AA, Hollenstein C, Ellert C, Schmitt JPM Journal of Vacuum Science & Technology A, 23(4), 922, 2005 |
| 9 |
High-efficiency p-i-n a-Si : H solar cells with low boron cross-contamination prepared in a large-area single-chamber PECVD reactor Kroll U, Bucher C, Benagli S, Schonbachler I, Meier J, Shah A, Ballutaud J, Howling A, Hollenstein C, Buchel A, Poppeller M Thin Solid Films, 451-52, 525, 2004 |
| 10 |
Reduction of the boron cross-contamination for plasma deposition of p-i-n devices in a single-chamber large area radio-frequency reactor Ballutaud J, Bucher C, Hollenstein C, Howling AA, Kroll U, Benagli S, Shah A, Buechel A Thin Solid Films, 468(1-2), 222, 2004 |