검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Review of progress in extreme ultraviolet lithography masks Hector S, Mangat P Journal of Vacuum Science & Technology B, 19(6), 2612, 2001 |
| 2 |
X-ray lithography for <= 100 nm ground rules in complex patterns Hector S, Pol V, Krasnoperova A, Maldonado J, Flamholz A, Heald D, Stahlhammer C, Galburt D, Amodeo R, Donohue T, Wind S, Buchigniano J, Viswanathan R, Khan M, Bollepalli S, Cerrina F Journal of Vacuum Science & Technology B, 15(6), 2517, 1997 |
| 3 |
Extendibility of X-Ray-Lithography to Less-Than-or-Equal-to-130 nm Ground Rules in Complex Integrated-Circuit Patterns Hector S, Chu W, Thompson M, Pol V, Dauksher B, Cummings K, Resnick D, Pendharkar S, Maldonado J, Mccord M, Krasnoperova A, Liebmann L, Silverman J, Guo J, Khan M, Bollepalli S, Capodieci L, Cerrina F Journal of Vacuum Science & Technology B, 14(6), 4288, 1996 |
| 4 |
Trench Isolation at 300 nm Active Pitch Using X-Ray-Lithography Perera AH, Thompson M, Hector S, Iyer S, Azrak MJ, Zavala M Journal of Vacuum Science & Technology B, 14(6), 4314, 1996 |
| 5 |
X-Ray-Induced Mask Contamination and Particulate Monitoring in X-Ray Steppers Capasso C, Pomerene A, Chu W, Leavey J, Lamberti A, Hector S, Oberschmidt J, Pol V Journal of Vacuum Science & Technology B, 14(6), 4336, 1996 |
| 6 |
Effect of Absorber Thickness on Image Shortening in X-Ray-Lithography Maldonado JR, Dellaguardia F, Hector S, Mccord M, Liebmann L, Oertel HK Journal of Vacuum Science & Technology B, 13(6), 3094, 1995 |