검색결과 : 1건
No. | Article |
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1 |
Selective epitaxial growth of B-doped SiGe and HCl etch Si for the formation of SiGe:B recessed source and drain (pMOS transistors) Radamson HH, Kolahdouz M, Ghandi R, Hallstedt J Thin Solid Films, 517(1), 84, 2008 |
No. | Article |
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1 |
Selective epitaxial growth of B-doped SiGe and HCl etch Si for the formation of SiGe:B recessed source and drain (pMOS transistors) Radamson HH, Kolahdouz M, Ghandi R, Hallstedt J Thin Solid Films, 517(1), 84, 2008 |