검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
High transmission pellicles for extreme ultraviolet lithography reticle protection Shroff YA, Leeson M, Yan PY, Gullikson E, Salmassi F Journal of Vacuum Science & Technology B, 28(6), C6E36, 2010 |
| 2 |
Experimental study of Cr/Sc multilayer mirrors for the nitrogen K-alpha-emission line Hardouin A, Delmotte F, Ravet MF, Bridou F, Jerome A, Varniere F, Montcalm C, Hedacq S, Gullikson E, Aubert P Journal of Vacuum Science & Technology A, 26(3), 333, 2008 |
| 3 |
Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks Liang T, Ultanir E, Zhang G, Park SJ, Anderson E, Gullikson E, Naulleau P, Salmassi F, Mirkarimi P, Spiller E, Baker S Journal of Vacuum Science & Technology B, 25(6), 2098, 2007 |
| 4 |
Absorbance measurement of polymers at extreme ultraviolet wavelength: Correlation between experimental and theoretical calculations Kwark YJ, Bravo-Vasquez JP, Chandhok M, Cao HD, Deng H, Gullikson E, Ober CK Journal of Vacuum Science & Technology B, 24(4), 1822, 2006 |
| 5 |
Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects Naulleau P, Goldberg KA, Anderson EH, Bokor J, Gullikson E, Harteneck B, Jackson K, Olynick D, Salmassi F, Baker S, Mirkarimi P, Spiller E, Walton C, Zhang GJ Journal of Vacuum Science & Technology B, 21(4), 1286, 2003 |
| 6 |
Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic Goldberg KA, Naulleau PP, Denham PE, Rekawa SB, Jackson KH, Liddle JA, Harteneck B, Gullikson E, Anderson EH Journal of Vacuum Science & Technology B, 21(6), 2706, 2003 |
| 7 |
Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic Naulleau P, Goldberg KA, Anderson EH, Attwood D, Batson P, Bokor J, Denham P, Gullikson E, Harteneck B, Hoef B, Jackson K, Olynick D, Rekawa S, Salmassi F, Blaedel K, Chapman H, Hale L, Mirkarimi P, Soufli R, Spiller E, Sweeney D, Taylor J, Walton C, O'Connell D, Tichenor D, Gwyn CW, Yan PY, Zhang GJ Journal of Vacuum Science & Technology B, 20(6), 2829, 2002 |
| 8 |
Effects of smoothing on defect printability at extreme ultraviolet wavelengths Cardinale GF, Ray-Chaudhuri AK, Fisher A, Mangat PSJ, Wasson J, Mirkarimi PB, Gullikson E Journal of Vacuum Science & Technology B, 18(6), 2944, 2000 |
| 9 |
At-wavelength detection of extreme ultraviolet lithography mask blank defects Jeong ST, Idir M, Lin Y, Johnson L, Rekawa S, Jones M, Denham P, Batson P, Levesque R, Kearney P, Yan PY, Gullikson E, Underwood JH, Bokor J Journal of Vacuum Science & Technology B, 16(6), 3430, 1998 |