화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Repair of Plasma Etch Related Gate Perimeter Damage Using Low-Temperature Oxidation
Guldi RL, Wyke DR
Journal of the Electrochemical Society, 143(2), 628, 1996
2 Source Drain Dislocations and Electrical Leakage in Titanium-Salicided CMOS Integrated-Circuits
Guldi RL
Journal of the Electrochemical Society, 141(7), 1957, 1994
3 Effect of Device Processing Conditions on Extended Dislocations and Defects in Ti-Salicided Source/Drain Regions of Silicon Integrated-Circuits
Guldi RL
Journal of the Electrochemical Society, 140(12), 3650, 1993