| 1 |
Engineering Multifunctionality in Hybrid Polyoxometalates: Aromatic Sulfonium Octamolybdates as Excellent Photochromic Materials and Self-Separating Catalysts for Epoxidation
Kumar A, Gupta AK, Devi M, Gonsalves KE, Pradeep CP
Inorganic Chemistry, 56(17), 10325, 2017 |
| 2 |
Co and terpolymer reactivity ratios of chemically amplified resists
Pujari NS, Wang MX, Gonsalves KE
Polymer, 118, 201, 2017 |
| 3 |
Effects of photoacid generator incorporation into the polymer main chain on 193 nm chemically amplified resist behavior and lithographic performance
Lee CT, Henderson CL, Wang MX, Gonsalves KE, Yueh W
Journal of Vacuum Science & Technology B, 25(6), 2136, 2007 |
| 4 |
New anionic photoacid generator bound polymer resists for EUV lithography
Wang MX, Yueh W, Gonsalves KE
Macromolecules, 40(23), 8220, 2007 |
| 5 |
Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers
Wang MX, Gonsalves KE, Yueh W, Roberts JM
Macromolecular Rapid Communications, 27(18), 1590, 2006 |
| 6 |
Synthesis, characterization, and preliminary biological study of poly(3-(tert-butoxycarbonyl)-N-vinyl-2-pyrrolidone)
He W, Gonsalves KE, Pickett JH, Halberstadt C
Biomacromolecules, 4(1), 75, 2003 |
| 7 |
Preparation of a photoacid generating monomer and its application in lithography
Wu HP, Gonsalves KE
Advanced Functional Materials, 11(4), 271, 2001 |
| 8 |
A novel single-component negative resist for DUV and electron beam lithography
Wu HP, Gonsalves KE
Advanced Materials, 13(3), 195, 2001 |
| 9 |
Novel positive-tone chemically amplified resists with photoacid generator in the polymer chains
Wu HP, Gonsalves KE
Advanced Materials, 13(9), 670, 2001 |
| 10 |
Organic-inorganic nanocomposites: Unique resists for nanolithography
Gonsalves KE, Merhari L, Wu HP, Hu YQ
Advanced Materials, 13(10), 703, 2001 |
