| 1 |
Effect of process conditions on the microstructural formation of dc reactively sputter deposited AIN
Ekpe SD, Jimenez FJ, Dew SK
Journal of Vacuum Science & Technology A, 28(5), 1210, 2010 |
| 2 |
Effect of magnetic field strength on deposition rate and energy flux in a dc magnetron sputtering system
Ekpe SD, Jimenez FJ, Field DJ, Davis MJ, Dew SK
Journal of Vacuum Science & Technology A, 27(6), 1275, 2009 |
| 3 |
Inhomogeneous rarefaction of the process gas in a direct current magnetron sputtering system
Jimenez F, Ekpe SD, Dew SK
Journal of Vacuum Science & Technology A, 24(4), 1530, 2006 |
| 4 |
Deposition rate model of magnetron sputtered particles
Ekpe SD, Bezuidenhout LW, Dew SK
Thin Solid Films, 474(1-2), 330, 2005 |
| 5 |
Measurement of energy flux at the substrate in a magnetron sputter system using an integrated sensor
Ekpe SD, Dew SK
Journal of Vacuum Science & Technology A, 22(4), 1420, 2004 |
| 6 |
Theoretical and experimental determination of the energy flux-during magnetron sputter deposition onto an unbiased substrate
Ekpe SD, Dew SK
Journal of Vacuum Science & Technology A, 21(2), 476, 2003 |
| 7 |
Investigation of thermal flux to the substrate during sputter deposition of aluminum
Ekpe SD, Dew SK
Journal of Vacuum Science & Technology A, 20(6), 1877, 2002 |
