화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 New modeling method for the dielectric relaxation of a DRAM cell capacitor
Choi S, Sun W, Shin H
Solid-State Electronics, 140, 29, 2018
2 Improved leakage current properties of ZrO2/(Ta/Nb)O-x-Al2O3/ZrO2 nanolaminate insulating stacks for dynamic random access memory capacitors
Onaya T, Nabatame T, Sawada T, Kurishima K, Sawamoto N, Ohi A, Chikyow T, Ogura A
Thin Solid Films, 655, 48, 2018
3 A mechanism for asymmetric data writing failure
Lee MJ, Park KW
Solid-State Electronics, 56(1), 211, 2011
4 A comparative study of the DRAM leakage mechanism for planar and recessed channel MOSFETs
Lee MJ, Baek CK, Park S, Chung IY, Park YJ
Solid-State Electronics, 53(9), 998, 2009