검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Influence of Copper Ion Concentration on the Kinetics of Formation of a Protective Layer on Copper in an Acidic CMP Solution Containing BTA and Glycine Choi S, Dornfeld DA, Doyle FM Journal of the Electrochemical Society, 160(10), H653, 2013 |
| 2 |
Copper CMP Modeling: Millisecond Scale Adsorption Kinetics of BTA in Glycine-Containing Solutions at pH 4 Choi S, Tripathi S, Dornfeld DA, Doyle FM Journal of the Electrochemical Society, 157(12), II1153, 2010 |
| 3 |
Self-conditioning fixed abrasive pad in CMP Kim H, Park B, Lee S, Jeong H, Dornfeld DA Journal of the Electrochemical Society, 151(12), G858, 2004 |
| 4 |
Optimization of CMP from the viewpoint of consumable effects Luo JF, Dornfeld DA Journal of the Electrochemical Society, 150(12), G807, 2003 |