검색결과 : 37건
| No. | Article |
|---|---|
| 1 |
Effect of process conditions on the microstructural formation of dc reactively sputter deposited AIN Ekpe SD, Jimenez FJ, Dew SK Journal of Vacuum Science & Technology A, 28(5), 1210, 2010 |
| 2 |
Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate Mohammad MA, Fito T, Chen J, Aktary M, Stepanova M, Dew SK Journal of Vacuum Science & Technology B, 28(1), L1, 2010 |
| 3 |
Nanomachining and clamping point optimization of silicon carbon nitride resonators using low voltage electron beam lithography and cold development Mohammad MA, Guthy C, Evoy S, Dew SK, Stepanova M Journal of Vacuum Science & Technology B, 28(6), C6P36, 2010 |
| 4 |
Simulation of electron beam lithography of nanostructures Stepanova M, Fito T, Szabo Z, Alti K, Adeyenuwo AP, Koshelev K, Aktary M, Dew SK Journal of Vacuum Science & Technology B, 28(6), C6C48, 2010 |
| 5 |
Effect of magnetic field strength on deposition rate and energy flux in a dc magnetron sputtering system Ekpe SD, Jimenez FJ, Field DJ, Davis MJ, Dew SK Journal of Vacuum Science & Technology A, 27(6), 1275, 2009 |
| 6 |
Nanoscale resist morphologies of dense gratings using electron-beam lithography Mohammad MA, Dew SK, Westra K, Li P, Aktary M, Lauw Y, Kovalenko A, Stepanova M Journal of Vacuum Science & Technology B, 25(3), 745, 2007 |
| 7 |
Inhomogeneous rarefaction of the process gas in a direct current magnetron sputtering system Jimenez F, Ekpe SD, Dew SK Journal of Vacuum Science & Technology A, 24(4), 1530, 2006 |
| 8 |
Self-organized Cu nanowires on glass and Si substrates from sputter etching Cu/substrate interfaces Stepanova M, Dew SK Journal of Vacuum Science & Technology B, 24(2), 592, 2006 |
| 9 |
Simulation of the spatial distribution and molecular weight of polymethylmethacrylate fragments in electron beam lithography exposures Aktary M, Stepanova M, Dew SK Journal of Vacuum Science & Technology B, 24(2), 768, 2006 |
| 10 |
Deposition rate model of magnetron sputtered particles Ekpe SD, Bezuidenhout LW, Dew SK Thin Solid Films, 474(1-2), 330, 2005 |