화학공학소재연구정보센터
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No. Article
1 실리콘 태양전지 투명전극용 스크린 프린팅을 이용한 구리 도금 전극 패터닝 형성
김경민, 조영준, 장효식
Korean Journal of Materials Research, 29(4), 228, 2019
2 Gradient filling of copper in porous silicon using a non-contact electrochemical method
Zhao MR, Shadman FH, Keswani M
Applied Surface Science, 445, 505, 2018
3 Effect of the deposition parameters on the voiding propensity of solder joints with Cu electroplated in a Hull cell
Wafula F, Liu Y, Yin L, Borgesen P, Cotts EJ, Dimitrov N
Journal of Applied Electrochemistry, 41(4), 469, 2011
4 Degradation of Poly(ethylene glycol) by Electrolysis During the Cu Electroplating: A Combined Experimental and Density Functional Theory Study
Won YS, Cho D, Kim Y, Lee J, Park SS
Journal of Applied Polymer Science, 117(4), 2083, 2010
5 Influence of Cu electroplating solutions on boron carbon nitride (BCN) film
Aoki H, Hara M, Masuzumi T, Mazumder MK, Ooi N, Watanabe D, Kimura C, Sugino T
Applied Surface Science, 255(6), 3719, 2009
6 Fabrication and characterization of Cu-Ni-YSZ SOFC anodes for direct use of methane via Cu-electroplating
Park EW, Moon H, Park MS, Hyun SH
International Journal of Hydrogen Energy, 34(13), 5537, 2009
7 Bottom-up copper fill with addition of mercapto alkyl carboxylic acid in electroless plating
Wang ZL, Obata R, Sakaue H, Takahagi T, Shingubara S
Electrochimica Acta, 51(12), 2442, 2006
8 Influence of copper content on NO removal of the activated carbon fibers produced by electroplating
Park SJ, Shin JS
Journal of Colloid and Interface Science, 264(1), 39, 2003
9 전해 동도금 처리에 의한 활성탄소섬유의 표면 특성 및 NO 제거
박수진, 신준식, 장유신
Journal of the Korean Industrial and Engineering Chemistry, 13(8), 777, 2002
10 Electrochemical deposition of Copper on patterned Cu/Ta(N)/SiO2 surfaces for super filling of sub-micron features
Li WH, Ye JH, Li SFY
Journal of Applied Electrochemistry, 31(12), 1395, 2001