화학공학소재연구정보센터
검색결과 : 15건
No. Article
1 Thermodynamic evaluation of nucleation as a method for selection of aluminium nitride modifications
Kudyakova VS, Shishkin RA, Zykov FM, Zvonarev KV, Chukin AV, Polyakov EV, Beketov AR
Journal of Crystal Growth, 486, 111, 2018
2 Investigation of bonded hydrogen defects in nanocrystalline diamond films grown with nitrogen/methane/hydrogen plasma at high power conditions
Tang CJ, Hou HH, Fernandes AJS, Jiang XF, Pinto JL, Ye H
Journal of Crystal Growth, 460, 16, 2017
3 Very low temperature epitaxy of Ge and Ge rich SiGe alloys with Ge2H6 in a Reduced Pressure - Chemical Vapour Deposition tool
Aubin J, Hartmann JM, Bauer M, Moffatt S
Journal of Crystal Growth, 445, 65, 2016
4 Thin films of tin(II) sulphide (SnS) by aerosol-assisted chemical vapour deposition (AACVD) using tin(II) dithiocarbamates as single-source precursors
Kevin P, Lewis DJ, Raftery J, Malik MA, O'Brien P
Journal of Crystal Growth, 415, 93, 2015
5 Atmospheric pressure chemical vapour deposition of electrochromic Mo-W thin oxide films: Structural, optoelectronic and vibration properties
Gesheva KA, Ivanova T, Kozlov M, Boyadzhiev S
Journal of Crystal Growth, 312(8), 1188, 2010
6 Development of m-plane GaN anisotropic film properties during MOVPE growth on LiAlO2 substrates
Mauder C, Reuters B, Khoshroo LR, Rzheutskii MV, Lutsenko EV, Yablonskii GP, Woitok JF, Heuken M, Kalisch H, Jansen RH
Journal of Crystal Growth, 312(11), 1823, 2010
7 Improved morphology for epitaxial growth on 4 degrees off-axis 4H-SiC substrates
Leone S, Pedersen H, Henry A, Kordina O, Janzen E
Journal of Crystal Growth, 311(12), 3265, 2009
8 Impact of the H-2 bake temperature on the structural properties of tensily strained Si layers on SiGe
Hartmann JM, Bogumilowciz Y, Abbadie A, Fillot F, Billon T
Journal of Crystal Growth, 310(10), 2493, 2008
9 Formation of a Si-Si3N4 nanocomposite from plasma enhanced chemical vapour deposition multilayer structures
Scardera G, Bellet-Amalric E, Bellet D, Puzzer T, Pink E, Conibeer G
Journal of Crystal Growth, 310(15), 3685, 2008
10 4H-SiC epitaxial layer growth by trichlorosilane (TCS)
La Via F, Izzo G, Mauceri M, Pistone G, Condorelli G, Perdicaro L, Abbondanza G, Calcagno L, Foti G, Crippa D
Journal of Crystal Growth, 311(1), 107, 2008