| 1 |
Quadrature moment simulation of silica nanoparticles aggregation and breakage in chemical mechanical polishing
Choi SG, Im GT, Kim EC, Park KH, Kim TS
Journal of Industrial and Engineering Chemistry, 107, 207, 2022 |
| 2 |
Shape classification of fumed silica abrasive and its effects on chemical mechanical polishing
Kim E, Lee J, Park Y, Shin C, Yang J, Kim T
Powder Technology, 381, 451, 2021 |
| 3 |
Surface polished of bulk methylammonium lead tribromide single crystal
Zhang H, Zhang BH, Wang X, Shao WY, Nie J, Liu J, Ouyang XP, Xu Q
Current Applied Physics, 20(10), 1145, 2020 |
| 4 |
Novel polystyrene/CeO2-TiO2 multicomponent core/shell abrasives for high-efficiency and high-quality photocatalytic-assisted chemical mechanical polishing of reaction-bonded silicon carbide
Gao B, Zhai WJ, Zhai Q, Zhang MZ
Applied Surface Science, 484, 534, 2019 |
| 5 |
Core/shell structured sSiO(2)/mSiO(2) composite particles: The effect of the core size on oxide chemical mechanical polishing
Chen Y, Zuo CZ, Chen AL
Advanced Powder Technology, 29(1), 18, 2018 |
| 6 |
Atomic-scale finishing of carbon face of single crystal SiC by combination of thermal oxidation pretreatment and slurry polishing
Deng H, Liu N, Endo K, Yamamura K
Applied Surface Science, 434, 40, 2018 |
| 7 |
Inhibition effect of glycine on molybdenum corrosion during CMP in alkaline H2O2 based abrasive free slurry
Yang G, He P, Qu XP
Applied Surface Science, 427, 148, 2018 |
| 8 |
Evaluation of subsurface damage inherent to polished GaN substrates using depth-resolved cathodoluminescence spectroscopy
Lee J, Kim JC, Kim J, Singh RK, Arjunan AC, Lee H
Thin Solid Films, 660, 516, 2018 |
| 9 |
Nd3+-doped colloidal SiO2 composite abrasives: Synthesis and the effects on chemical mechanical polishing (CMP) performances of sapphire wafers
Liu TT, Lei H
Applied Surface Science, 413, 16, 2017 |
| 10 |
Germanium electrochemical study and its CMP application
Zhang L, Zhang BG, Pan BC, Wang CW
Applied Surface Science, 422, 247, 2017 |
