Organic-inorganic halide perovskite materials have been demonstrated with wide applications in optoelectronics and ionization radiation detection. For bulk as-grown crystals, the existence of surface cracks and defects can significantly increase charges recombination and reduce the performance of the device. Herein, we polished the crystal surfaces with both mechanical and chemical mechanical methods at room temperature. After been chemical-mechanical polished, the crystal surface with root mean square roughness about 0.5 nm was obtained. Optical transmission and photoluminescence spectra indicate that chemical mechanical polishing technology can effectively reduce the density of crystal surface defects. The achieved low leakage current density on the surface and bulk crystal is 0.05 nA mm(-2) and 0.07 nA mm(-2), respectively. Furthermore, the current-voltage curve under visible photons and X-ray photons reveals that surface polishing treatment can suppress the charges recombination and increase the charges transportation.