화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 The bioliq (R) Entrained-Flow Gasifier - a Module for the German Energiewende
Eberhard M, Santo U, Boning D, Schmid H, Michelfelder B, Zimmerlin B, Gunther A, Weigand P, Muller-Hagedorn M, Stapf D, Kolb T
Chemie Ingenieur Technik, 90(1-2), 85, 2018
2 Study on Stiffness and Conditioning Effects of CMP Pad Based on Physical Die-Level CMP Model
Fan W, Boning D, Charns L, Miyauchi H, Tano H, Tsuji S
Journal of the Electrochemical Society, 157(5), H526, 2010
3 Characterization of thermoset and thermoplastic polyurethane pads, and molded and non-optimized machined grooving methods for oxide chemical mechanical planarization applications
Sampurno Y, Borucki L, Zhuang Y, Misra S, Holland K, Boning D, Philipossian A
Thin Solid Films, 517(5), 1719, 2009
4 Molecular beam epitaxial growth of indium antimonide and its characterization
Pharn HT, Yoon SF, Boning D, Wicaksono S
Journal of Vacuum Science & Technology B, 25(1), 11, 2007
5 A method for direct measurement of substrate temperature during copper CMP
Sampurno YA, Borucki L, Zhuang Y, Boning D, Philipossian A
Journal of the Electrochemical Society, 152(7), G537, 2005
6 Estimating the effective pressure on patterned wafers during STI CMP
Sorooshian J, Borucki L, Timon R, Stein D, Boning D, Hetherington D, Philipossian A
Electrochemical and Solid State Letters, 7(10), G204, 2004
7 Arrhenius characterization of ILD and copper CMP processes
Sorooshian J, DeNardis D, Charns L, Li Z, Shadman F, Boning D, Hetherington D, Philipossiana A
Journal of the Electrochemical Society, 151(2), G85, 2004
8 Chip-scale modeling of electroplated copper surface profiles
Park T, Tugbawa T, Boning D, Chidambaram C, Borst C, Shin G
Journal of the Electrochemical Society, 151(6), C418, 2004
9 Characterization and modeling of dynamic thermal behavior in CMP
White D, Melvin J, Boning D
Journal of the Electrochemical Society, 150(4), G271, 2003
10 Wafer scale variation of planarization length in chemical mechanical polishing
Oji C, Lee B, Ouma D, Smith T, Yoon J, Chung J, Boning D
Journal of the Electrochemical Society, 147(11), 4307, 2000