화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Nondestructive in Situ Characterization of Molecular Structures at the Surface and Buried Interface of Silicon-Supported Low-k Dielectric Films
Myers JN, Zhang XX, Bielefeld J, Lin QH, Chen Z
Journal of Physical Chemistry B, 119(4), 1736, 2015
2 Valence band offset and Schottky barrier at amorphous boron and boron carbide interfaces with silicon and copper
King SW, French M, Xu GH, French B, Jaehnig M, Bielefeld J, Brockman J, Kuhn M
Applied Surface Science, 285, 545, 2013
3 X-ray Photoelectron Spectroscopy Investigation of the Schottky Barrier at a-BN:H/Cu Interfaces
King SW, French M, Bielefeld J, Jaehnig M, Kuhn M, French B
Electrochemical and Solid State Letters, 14(12), H478, 2011
4 Thermal conductivity and sound velocity measurements of plasma enhanced chemical vapor deposited a-SiC:H thin films
Hondongwa DB, Olasov LR, Daly BC, King SW, Bielefeld J
Thin Solid Films, 519(22), 7895, 2011