화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 The effects of grain boundary scattering on electrical resistivity of Ag/NiSi suicide films formed on silicon substrate at 500 degrees C by RTA
Utlu G, Artunc N
Applied Surface Science, 310, 248, 2014
2 Temperature and thickness dependence of the grain boundary scattering in the Ni-Si suicide films formed on silicon substrate at 500 degrees C by RTA
Utlu G, Artunc N, Selvi S
Materials Chemistry and Physics, 132(2-3), 421, 2012
3 Structural and electrical characterization of the nickel silicide films formed at 850 degrees C by rapid thermal annealing of the Ni/Si(100) films
Utlu G, Artunc N, Budak S, Tari S
Applied Surface Science, 256(16), 5069, 2010