검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Advanced thermal processing of ultrashallow implanted junctions using flash lamp annealing Skorupa W, Gebel T, Yankov RA, Paul S, Lerch W, Downey DF, Arevalo EA Journal of the Electrochemical Society, 152(6), G436, 2005 |
| 2 |
Deactivation of solid phase epitaxy-activated boron ultrashallow junctions Lerch W, Paul S, Niess J, Cristiano F, Lamrani Y, Calvo P, Cherkashin N, Downey DF, Arevalo EA Journal of the Electrochemical Society, 152(10), G787, 2005 |
| 3 |
Secondary ion mass spectrometry analysis of implanted and rapid thermal processing annealed wafers for sub-100 nanometer technology Ehrke U, Sears A, Lerch W, Paul S, Roters G, Downey DF, Arevalo EA Journal of Vacuum Science & Technology B, 22(1), 346, 2004 |