화학공학소재연구정보센터
검색결과 : 16건
No. Article
1 Poole-Frenkel emission and defect density in a-Si:H/nc-Si:H multilayer films for "all silicon" third generation photovoltaics
Kherodia A, Panchal AK
Thin Solid Films, 654, 16, 2018
2 Thin SiO2/a-Si:H/SiO2 multilayer insulators obtained by electron cyclotron resonance chemical vapor deposition at room temperature for possible application in non-volatile memories
Mateos D, Diniz JA, Nedev N, Munoz SNM, Curiel M, Mederos M, Valdez B, Montero G
Thin Solid Films, 628, 96, 2017
3 Investigation of functionalized silicon nanowires by self-assembled monolayer
Hemed NM, Convertino A, Shacham-Diamand Y
Applied Surface Science, 367, 231, 2016
4 The influence of chemical groups on the mechanical properties of SiCNH coatings deposited on 7075 aluminum alloy
Kaczmarek L, Kyziol K, Sawicki J, Steglinski M, Radziszewska H, Szymanski W, Kolodziejczyk L, Atraszkiewicz R, Kottfer D, Zawadzki P
Thin Solid Films, 534, 15, 2013
5 Effects of H-2 and Ar flow rates on the deposition of hydrogenated silicon thin films by an inductive coupled plasma-chemical vapor deposition system
Li C, Hsieh JH, Huang KL, Shao YT, Chen YW
Thin Solid Films, 544, 37, 2013
6 LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition
Stuchlik J, Ledinsky M, Honda S, Drbohlav I, Mates T, Fejfar A, Hruska K
Thin Solid Films, 517(24), 6829, 2009
7 Passivation of Si and a-Si : H surfaces by thin oxide and oxy-nitride layers
Pincik E, Kobayashi H, Rusnak J, Takahashi M, Brunner R, Jergel M, Morales-Acevedo A, Ortega L, Kakos J
Applied Surface Science, 252(21), 7713, 2006
8 On a presence of SimHn clusters in a-Si : H/c-Si structures
Kopani M, Pincik E, Kobayashi H, Takahashi M, Fujiwara N, Brunner R, Jergel M, Ortega L
Applied Surface Science, 252(21), 7722, 2006
9 Synthesis, microstructure and thermal properties of photoluminescent hydrogenated amorphous silicon oxide nanopowders
Su WF, Guo HR
Materials Chemistry and Physics, 74(3), 239, 2002
10 Memory effects in highly resistive p-i-n heterojunctions for optical applications
Schwarz R, Louro P, Vygranenko Y, Fernandes M, Vieira M, Schubert M
Thin Solid Films, 403-404, 363, 2002