1 |
Poole-Frenkel emission and defect density in a-Si:H/nc-Si:H multilayer films for "all silicon" third generation photovoltaics Kherodia A, Panchal AK Thin Solid Films, 654, 16, 2018 |
2 |
Thin SiO2/a-Si:H/SiO2 multilayer insulators obtained by electron cyclotron resonance chemical vapor deposition at room temperature for possible application in non-volatile memories Mateos D, Diniz JA, Nedev N, Munoz SNM, Curiel M, Mederos M, Valdez B, Montero G Thin Solid Films, 628, 96, 2017 |
3 |
Investigation of functionalized silicon nanowires by self-assembled monolayer Hemed NM, Convertino A, Shacham-Diamand Y Applied Surface Science, 367, 231, 2016 |
4 |
The influence of chemical groups on the mechanical properties of SiCNH coatings deposited on 7075 aluminum alloy Kaczmarek L, Kyziol K, Sawicki J, Steglinski M, Radziszewska H, Szymanski W, Kolodziejczyk L, Atraszkiewicz R, Kottfer D, Zawadzki P Thin Solid Films, 534, 15, 2013 |
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Effects of H-2 and Ar flow rates on the deposition of hydrogenated silicon thin films by an inductive coupled plasma-chemical vapor deposition system Li C, Hsieh JH, Huang KL, Shao YT, Chen YW Thin Solid Films, 544, 37, 2013 |
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LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition Stuchlik J, Ledinsky M, Honda S, Drbohlav I, Mates T, Fejfar A, Hruska K Thin Solid Films, 517(24), 6829, 2009 |
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Passivation of Si and a-Si : H surfaces by thin oxide and oxy-nitride layers Pincik E, Kobayashi H, Rusnak J, Takahashi M, Brunner R, Jergel M, Morales-Acevedo A, Ortega L, Kakos J Applied Surface Science, 252(21), 7713, 2006 |
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On a presence of SimHn clusters in a-Si : H/c-Si structures Kopani M, Pincik E, Kobayashi H, Takahashi M, Fujiwara N, Brunner R, Jergel M, Ortega L Applied Surface Science, 252(21), 7722, 2006 |
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Synthesis, microstructure and thermal properties of photoluminescent hydrogenated amorphous silicon oxide nanopowders Su WF, Guo HR Materials Chemistry and Physics, 74(3), 239, 2002 |
10 |
Memory effects in highly resistive p-i-n heterojunctions for optical applications Schwarz R, Louro P, Vygranenko Y, Fernandes M, Vieira M, Schubert M Thin Solid Films, 403-404, 363, 2002 |