| 초록 |
Lithography has been the key technology of semiconductor manufacturing and is the main reason why Korean semiconductor companies are leading the world memory market. Lithography technology is composed of two major parts, optics and chemistry. We would like to discuss the basics and trend of these two parts. Resolution and depth of focus of lithography are determined by the wavelength and numerical aperture of the scanner. Resolution enhancement technologies such as phase shift mask, off-axis illumination, and optical proximity correction will be briefly introduced. As for the chemistry, novolak type resists were used for g- and i-line, but chemically amplified resists have been used for 248 and 193 nm. Extreme ultraviolet (EUV) lithography is about to ready for manufacturing among the many other technologies. We will discuss why EUV will be used for the future lithography technology. |
