| 초록 |
Holographic lithography(HL) is the one of the methods to fabricate 3D photonic crystal (PhC) structures. SU-8 has been commercially used to fabricate PhC by using HL. However, SU-8 templates often suffer from large vertical shrinkage causing dimensional distortion during post-exposure baking (PEB) and development. In this study, we reported new photo-curable resin, poly(styrene-ran-glycidyl methacrylate)(PSGMA), having low-vertical shrinkage for fabricating 3D PhC by using HL. In our work, the GMA ratio of synthesized PSGMA and the temperature of PEB process were optimized for HL. And 3D PhC with face-centered cubic (FCC) symmetry was created by using single prism HL. Finally, the interlayer distance in the [111] direction of FCC structure and reflectance peak of PSGMA and conventional SU-8 were measured. The 3D structure of PSGMA showed larger interlayer distance and longer reflectance peak position than that of SU-8, due to lower volume shrinkage. |
