| 초록 |
Self assembly provides a qualified alternative for fabricating pattern structures useful for various nanotechnological devices. Self assembled nanostructures generated from polymer systems such as polymer blends and block copolymers have gained a great attention not only because of the variety of nanostructures they can evolve but also because of the controllability by external stimuli including electrical, mechanical, solvent and surface confinement. We introduce various methods to producing polymeric micro/nano structures for organic electronic applications. Dewetting of a polymer thin film is utilized for creating highly ordered nanostructures with micro-imprinting lithography. In addition, the guided assembly confined onto either chemically or topographically modified surface allows us to fabricate ordered nanoscale templates. The controlled wetting and dewetting of a PS-b-PEO copolymer gave rise to a hierarchical ordered structure on a chemically modified patterned surface. |
